Electron lithography using photocathode
CA 2107451 C · Owner: Platzman, Philip Moss · Inventors: Brandes, George Raymond; Platzman, Philip Moss
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Sub-micron pattern delineation, importantly in the fabrication of large scale integrated devices, is based on a patterned photocathode. Functionally the, photocathode plays the role of the mask in competing systems either in proximity, printing or in projection. In operation the photocathode is illuminated by ultraviolet radiation to release electrons which are brought to focus on a resist-coated wafer with assistance of a uniform magnetic field together with an accelerating applied voltage.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed September 30, 1993 and granted August 18, 1998. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended September 30, 2013.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by September 30, 2015.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.