Pyrometer temperature measurement of plural wafers stacked in a processing chamber
CA 2102795 A1 · Owner: Ishikawa, Hiroichi · Inventors: Kolesa, Michael Steven; Ishikawa, Hiroichi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An apparatus for batch processing flat articles such as semiconductor wafers (14) in a sealed chamber (12) and a method of measuring and controlling the temperature of articles stacked in parallel in the chamber. A pyrometer (53) is positioned outside of the chamber and directed, either directly or with mirrors through a, window (51) in the chamber wall (11) so that only energy from wafers removed from the ends of the stack is received by the pyrometer. The pyrometer is inclined at an angle so that substantially all energy from the opposite side of the stack and reflected through spaces between facing parallel pairs of wafer surfaces will have been reflected a large number of times by the …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed May 14, 1992. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended May 14, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by May 14, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.