Focused ion beam implantation apparatus
CA 2099685 C · Owner: Nakamura, Takao · Inventors: Iiyama, Michitomo; Nakamura, Takao
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A focused ion beam implantation apparatus comprises a vacuum chamber, an ion source generating an ion beam a means for accelerating, the ion beam a means for eliminating unwanted ion species in the ion beam, and a means for focusing the ion beam on a target. The apparatus further includes a means for scanning the ion beam relative to the target and means for inclining the ion beam relative to the target.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed June 29, 1993 and granted August 4, 1998. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended June 29, 2013.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by June 29, 2015.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.