Terephthalic acid copolyamides
CA 2097615 C · Owner: Mok, Steven Lai-Kwok · Inventors: Mok, Steven Lai-Kwok; Pagilagan, Rolando U.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A partially crystalline copolyamide formed from an aromatic carboxylic acid that is terephthalic acid or a mixture of terephthalic acid and isophthalic acid containing less than 40 % of isophthalic acid, and an aliphatic diamine that is a mixture of hexamethylene diamine and 2-methyl pentamethylene diamine. The aliphatic diamine is at least 44 %, molar basis, of hexamethylene diamine and the amount of isophthalic acid plus 2-methyl pentamethylene diamine is in the range of 15-35 %, molar basis. of the total amount of aromatic carboxylic acid and aliphatic diamine. The copolyamides have a melting point of 280-330 °C. The copolyamide preferably has a heat of fusion of greater than 17 …
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed December 11, 1991 and granted December 17, 2002. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended December 11, 2011.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by December 11, 2013.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.