Positive resist composition
CA 2095107 A1 · Owner: Uetani, Yasunori · Inventors: Nakanishi, Hirotoshi; Uetani, Yasunori; Tomioka, Jun
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas:, (I), (II), wherein R1 and R2 each represent hydrogen halogen, -OCOR3 , alkyl or alkoxy in which R3 represents alkyl or phenyl, x and y each represent 1, 2 or 3 and R, R0, R', and R0' each represent hydrogen atom alkyl or phenyl, group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinonediazide material. This composition is excellent in the balance between properties such as resolution …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed April 28, 1993. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended April 28, 2013.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by April 28, 2015.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.