Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same
CA 2092783 A1 · Owner: Ueki, Hiromi · Inventors: Kusumoto, Takehiro; Ueda, Yuji; Ueki, Hiromi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5):, (5), or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity etc.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed March 26, 1993. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended March 26, 2013.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by March 26, 2015.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.