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Arrangement for generating a plasma by means of cathode sputtering and microwave irradiation

CA 2092599 A1 · Owner: Latz, Rudolf · Inventors: Ritter, Jochen; Latz, Rudolf; Scherer, Michael

CIPO record

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Its claims, description and drawings are in the Canadian Patents Database.

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Abstract From the Canadian patent

Title: Arrangement for generating a plasma by means of cathode sputtering and microwave irradiation, The invention relates to an arrangement for generating a plasma by means of cathode sputtering and microwave irradiation. Herein the dc and/or ac voltage (10) of a magnetron is connected to the cathode (9) and a microwave is irradiated into the region between the cathode (9) and a substrate (5). The irradiation of the microwave takes place in the region of the magnetic field (22, 23) of the magnetron wherein the magnetic field and the microwave are layed out so that an electron cyclotron resonance develops and the microwave is absorbed in the plasma. (Fig. 1).

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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed March 26, 1993. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended March 26, 2013.
  • A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by March 26, 2015.
  • We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
FiledMarch 26, 1993
GrantedNo grant recorded
Term endedMarch 26, 2013
Patent numberCA 2092599 A1
Classification (IPC)C23C14/28 +2 more

Timeline

Timeline From CIPO dates

1994199619982000200220042006200820102012Application filedMarch 26, 1993Term endedMarch 26, 2013

Sources & verification

Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.