Sor exposure system and method of manufacturing semiconductor devices using same
CA 2077237 C · Owner: Amemiya, Mitsuaki · Inventors: Ozawa, Kunitaka; Amemiya, Mitsuaki; Mori, Makiko
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
In an SOR exposure system for transferring patterns on masks to semiconductor wafers by using SOR light reflected by an X-ray reflecting mirror, a first shutter device for shielding at least .gamma. rays and a second shutter device for shielding X-rays are provided between the SOR ring and the mirror inside a beam port, and an exposure adjustment device for adjusting the amount of exposure when a circuit pattern on a mask is transferred to a wafer is provided between the mirror and the wafer. As a result, the human body can be protected against radiation rays, such as gamma rays generated from the SOR ring when electrons are implanted thereto or when the SOR ring is stopped. Damage to the …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed August 31, 1992 and granted August 18, 1998. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended August 31, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by August 31, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.