Alkaline-etch resistant dry film photoresist
CA 2076727 A1 · Owner: Mayes, Richard T. · Inventors: Pohl, Rudolph L.; Mayes, Richard T.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
In an aqueous-developable dry-film photoresist containing a carboxyl-group containing film-forming polymeric binder the, improvement wherein the binder is obtained by polymerizing a mixture including: (a) at least one monomer of the formula H2C=CRCOO(CnH2n)X(CpH2p)mR', wherein R is hydrogen or methyl and R' is a saturated C5-C12 bridged alkyl optionally substituted by at least one C1-C4 alkyl or halogen, X is oxygen or sulfur n is, 2-4, p is 0-4, m is 0-2; and (b) at least one C3-C15 .alpha..beta.unsaturated carboxyl-containing or anhydride-containing monomer having 3-15 carbon atoms.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed August 24, 1992. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended August 24, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by August 24, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.