Photocurable composition, flexible photosensitive articles made therefrom and methods of improving solvent resistance and flexibility of those articles
CA 2076511 A1 · Owner: Pt Sub, Inc. · Inventors: Williams, Trevor J.; Mirle, Srinivas K.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An aqueous developable photocurable composition, and a method of improving solvent resistance and flexibility are disclosed. The composition comprises (a) an acid-containing copolymer having an acid ephr of at least 0.20 and (b) an acid-containing polymer suitable for flexibilizing the composition which has, at least one free ethylenically unsaturated group. It is preferable that either (a) or (b) or both are further reacted with a compound having a free ethylenically unsaturated group and a free acid reactive group, e.g. glycidyl(meth)acrylate. When the composition is formulated with an ethylenically unsaturated monomer and photoinitiator the, photocurable composition is especially …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed August 20, 1992. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended August 20, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by August 20, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.