Method for forming a seed and a semiconductor film using said seed
CA 2071192 C · Owner: Canon Kabushiki Kaisha · Inventors: Aiba, Toshiaki; Morishita, Masakazu
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A seed is formed in a manner that a, crystalline film is formed on an underlayer material, and then partly made amorphous by ion implanting impurities into the crystalline film with a crystalline portion left behind in part thereof. After forming a step configuration on the underlayer material, the crystalline film is formed, and ions are implanted over its entire surface of the crystalline film.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed June 12, 1992 and granted September 30, 1997. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended June 12, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by June 12, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.