Process and apparatus for plasma cvd coating or plasma treating substrates
CA 2067309 C · Owner: Schott Glaswerke · Inventors: Otto, Jurgen
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
To provide large-surface substrates economically and in a short time, with coatings which are to be more impenetrable and more homogeneous than conventionally produced coatings a, plasma CVD process is employed in which a reaction gas capable of depositing a coating material therefrom flows over the surface to be coated and the reaction gas is excited into a band-shaped plasma by microwaves fed from two microwave feeds in a device comprising end walls (2 3) and a waveguide, (1) with a square cross-section in which two standing waves polarized perpendicular to one another are excited and are shifted relative to one another by one-quarter wavelength the coupling of the microwaves to the …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed April 27, 1992 and granted July 18, 2000. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended April 27, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by April 27, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.