Photosensitive resin composition
CA 2062860 A1 · Owner: Ueda, Koichi · Inventors: Ueda, Koichi; Kanda, Kazunori; Kusuda, Hidefumi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The present invention imparts elasticity reproducibility of dots, film toughness and wear resistance to printing plates obtained therefrom, in addition to the good water developability and mechanical properties. The present invention thus provides a photosensitive resin composition comprising;, (A) 10 to 90 % by weight of specific crosslinked polymer particles having a particle size of 0.01 to 5 micron, (B) 10 to 70 % by weight of a specific hydrophobic elastomer, (C) 1 to 25 % by weight of a hydophilic polymer having a molecular weight of 1,000 to 1,000,000 (D) 1 to 30 % by weight of a basic nitrogencontaining compound, (E) 1 to 60 % by weight of a photopolymerizable ethylenically …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed March 12, 1992. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended March 12, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by March 12, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.