Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography
CA 2059345 C · Owner: Wells, David L. · Inventors: Davis, Clark; Jacobsen, Stephen C.; Wells, David L.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Apparatus for non-planar treatment of a workpiece utilizing exposure beam lithography includes a vacuum chamber an exposure beam generator such as an electron beam generator disposed in the chamber for directing a beam towards a work location, a chuck disposed in the chamber for holding and positioning the workpiece at the work location, a rotary motorized stage disposed in the chamber and responsive to first control signals for selectively rotating the chuck, and thus the workpiece to thereby expose different areas of the workpiece to the beam, and a linear motorized stage disposed in the chamber on which the rotary stage is mounted said, linear motor being responsive to second control …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed January 14, 1992 and granted December 1, 1998. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended January 14, 2012.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by January 14, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.