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Canadian application, no grantCanada

Chemical vapor deposition silicon and silicon carbide having improved optical properties

CA 2058809 A1 · Owner: Taylor, Raymond L. · Inventors: Taylor, Raymond L.; Goela, Jitendra S.

CIPO record

Overview

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Its claims, description and drawings are in the Canadian Patents Database.

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Abstract From the Canadian patent

Abstract of the Disclosure, The optical transmission of chemical vapor deposition-produced silicon is dramatically enhanced by annealing at temperatures in the range of from about 1300°C to about 1500°C. Chemical vapor deposited silicon carbide which, is not ordinarily transmitting of infrared light may be made, transmitting through annealing at temperatures in the range of from about 1800°C to about 2600°C.

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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed January 6, 1992. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended January 6, 2012.
  • A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by January 6, 2014.
  • We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
FiledJanuary 6, 1992
GrantedNo grant recorded
Term endedJanuary 6, 2012
Patent numberCA 2058809 A1
Classification (IPC)C30B28/14 +2 more

Timeline

Timeline From CIPO dates

1993199519971999200120032005200720092011Application filedJan 6, 1992Term endedJan 6, 2012

Sources & verification

Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.