Process for fabricating a device
CA 2049795 C · Owner: Thompson, Larry Flack · Inventors: Reichmanis, Elsa; Nalamasu, Omkaram; Taylor, Gary Newton
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
11-, It has been found that surface reactions with basic materials such as amines found in the processing environment during lithographic processing contribute to a loss of linewidth control for resists such as chemically amplified resists, This loss in linewidth results from the reaction of the acid generated by exposing radiation with, for example, the amine resulting in a lack of chemical reaction where such reaction is desired. The problem is solved in one embodimentby employing an acid containing barrier layer on the resist.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed August 23, 1991 and granted October 14, 1997. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended August 23, 2011.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by August 23, 2013.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.