Plasma processing apparatus having an electrode enclosing the space between cathode and anode
CA 2048470 C · Owner: Canon Kabushiki Kaisha · Inventors: Okamura, Nobuyuki; Goto, Haruhiro H.; Yamagami, Atsushi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A plasma processing apparatus comprises: a first electrode connectable with a plasma generating power source; a second electrode capable of supporting a substrate to be subjected to a plasma-involving surface treatment; a third electrode enclosing a space between the first and second electrodes all the, electrodes being positioned in an evacuatable chamber; and potential control means for controlling the potential of the third electrode.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed August 6, 1991 and granted December 14, 1999. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended August 6, 2011.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by August 6, 2013.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.