Process for exposing a photosensitive resin composition to light
CA 2043822 A1 · Owner: Arimatsu, Seiji · Inventors: Arimatsu, Seiji; Konishi, Katsuji; Kanda, Kazunori
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The present invention provides an improved process by which dissolved oxygen is effectively removed from a photosensitive resin layer of a photosensitive resin plate. The process comprises preliminary exposing to light the photosensitive resin plate to quench oxygen dissolved in said photosensitive resin layer before conducting a main exposure, wherein the photosensitive resin layer is prepared from a photosensitive resin composition which comprises (a) a polymer binder, (b) a radically polymerizable monomer (c) a sensitizing dye, and, (d) a photopolymerization initiator which is excited by a light of a different wave length from a light exciting the sensitizing dye, the preliminary …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed June 4, 1991. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended June 4, 2011.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by June 4, 2013.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.