Cvd apparatus containing single u-shaped discharge electrode held in parallel with a substrate
CA 2041495 C · Owner: Takeuchi, Yoshiaki · Inventors: Kodama, Masaru; Takeuchi, Yoshiaki; Murata, Masayoshi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A plasma CVD apparatus whose discharge electrode is a single line member bent in a U shape in an alternating manner and in which a substrate to be processed is held substantially in parallel to the discharge electrode. The electric field around the electrode becomes stronger and the intensity distribution of this field becomes even. As a result, a product film formed on the substrate surface has a uniform thickness, and the film can be formed at high speeds.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed April 30, 1991 and granted September 22, 1998. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended April 30, 2011.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by April 30, 2013.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.