Process for reducing the defect density in ultra-thin films
CA 2039475 A1 · Owner: Hoechst Aktiengesellschaft · Inventors: Mohwald, Helmuth; Bibo, Anna M.; Peterson, Ian R.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Process for reducing the defect density in ultra-thin films, A process for reducing the defect density in a monomolecular film comprising an organic, water-insoluble compound whose molecules have an essentially regular arrangement, in which this film passes at least 10 times through the phase transition between partially ordered phases of the film material, which process has the advantage that nearly defect-free monomolecular films can be prepared with simple technical means for a wide range of practical applications.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed March 28, 1991. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended March 28, 2011.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by March 28, 2013.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.