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Canadian application, no grantCanada

Copolyester resin and resin composition

CA 2037416 A1 · Owner: Nakane, Toshio · Inventors: Hijikata, Kenji; Nakane, Toshio; Konuma, Hiroaki

CIPO record

Overview

Drawings and full text

Its claims, description and drawings are in the Canadian Patents Database.

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Abstract From the Canadian patent

A copolyester resin is useful for film improving heat-sealing property is produced by, polycondensation of (a) terephthalic acid or a dialkyl terephthalate, (b) at least one alkylene glycol having 2 to 8 carbon atoms and (c) a dimer diol comprising as the main component a compound of the following formula (1):, (1), wherein R1 through R4 are each an unsaturationfree, substantially linear group and, in particular, R1 and R2 each represent an alkyl group and R3 and R4 each represent an alkylene group, the total number of carbon atoms of R1 R2, R3 and R4 being 22 to 34, The film is flexible and colorless.

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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed March 1, 1991. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended March 1, 2011.
  • A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by March 1, 2013.
  • We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
FiledMarch 1, 1991
GrantedNo grant recorded
Term endedMarch 1, 2011
Patent numberCA 2037416 A1
Classification (IPC)C08G63/18 +2 more

Timeline

Timeline From CIPO dates

1992199419961998200020022004200620082010Application filedMarch 1, 1991Term endedMarch 1, 2011

Sources & verification

Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.