Self-aligned gate process for fabricating field emitter arrays
CA 2034481 C · Owner: Longo, Robert T. · Inventors: Lamb, Arlene E.; Manoly, Arthur E.; Rolph, Randy K.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Conical field emitter elements are formed on a surface of a substrate after which a layer of metal is deposited on top of the substrate surface and over the field emitter elements. A layer of oxide is then deposited over the metal layer. Another layer of metal is deposited over the layer of oxide to form a gate metal layer. A layer of photoresist is then deposited over the gate metal layer. The layer of photoresist is then plasma etched in an oxygen atmosphere to cause portions of the photoresist above respective field emitter elements to be removed and provide self-aligned holes in the photoresist over each of the field emitter elements. The size of the holes may be controlled by …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed April 23, 1990 and granted October 5, 1993. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended April 23, 2010.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by April 23, 2012.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.