Method for forming a photoresist with a cover coat
CA 2031395 A1 · Owner: Sakurai, Kiyomi · Inventors: Sakurai, Kiyomi; Yamagami, Yoshikazu
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An improved method for forming a photoresist with a cover coat comprising forming a photosensitive resinous layer on a conductive board by an anionic electrodeposition coating means, washing with water, dipping the coated board into a water dispersion comprising 100 to 30% by weight (in solid) of an acrylic polymer of perfluoro alkyl acrylate or methacrylate and other .alpha..beta. -ethylenically unsaturated monomer and 0 to 70% by weight (in solid) of a water soluble high molecular weight compound, pH of which is controlled in 7.0 to 9.0, and finally drying. In this method only one drying, operation is required at the final stage.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed December 3, 1990. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended December 3, 2010.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by December 3, 2012.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.