Photosensitive resin composition for flexographic printing
CA 2031379 A1 · Owner: Ueda, Koichi · Inventors: Konishi, Katsuji; Kusuda, Hidefumi; Ueda, Koichi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Disclosed is a photosensitive resin composition for flexographic printing which has high water developability and good mechanical strength. The resin composition comprises (A) a partially crosslinked copolymer prepared by a radical emulsion polymerization of a specific monomer mixture (B) a linear polymer having a molecular weight of at least 5,000, which has at least 30 mol % of a conjugated diene unit, (C) a basic nitrogen atom-containing compound (D) a photopolymerizable ethylenically unsaturated monomer and (E) a photopolymerization initiator. The present invention also provides a resin plate for flexographic printing obtained from the above mentioned resin composition and a process for …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed December 3, 1990. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended December 3, 2010.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by December 3, 2012.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.