Geometries and configurations for magnetron sputtering apparatus
CA 2029755 C · Owner: Van Horn, Craig C. · Inventors: Seddon, Richard I.; Scobey, Michael A.; Seeser, James W.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A thin film coating system incorporates separate separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed November 13, 1990 and granted August 1, 2000. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended November 13, 2010.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by November 13, 2012.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.