Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists
CA 2019669 A1 · Owner: Loctite (Ireland) Limited · Inventors: Coakley, Pauline; Woods, John
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Anionically Polymerizable Monomers Polymers thereof, and Use of such Polymers in Photoresists" Anionically polymerizable monomers containing at least one silicon or titanium atom form polymeric photoresists having good dry etch resistance for use in microlithography. The monomers are of the formula, I, wherein A is -H or -CH=CH2; X is a strong electron withdrawing group; Y is a strong electron withdrawing group containing at least one silicon or titanium atom. Preferably Y is wherein n is 1-5 and R2, R3 and R4 are C1-C10 alkyl. A particularly preferred monomer is 3-trimethylsilylpropyl 2-cyanoacrylate. Methods for applying a resist coating by vapour deposition of these monomers and …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed June 22, 1990. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended June 22, 2010.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by June 22, 2012.
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Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.