Electron beam direct printing apparatus
CA 2010414 C · Owner: Murakami, Hidenobu · Inventors: Kamio, Masashi; Murakami, Hidenobu; Tobuse, Hiroaki
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Printing pattern information from a printing pattern CAD is converted and output as deflection scanning data for the X-axis and the Y-axis by a deflection scanning data generating means. An electron beam deflection scanning means executes deflection scanning by an electron beam on a circuit printing base on the basis of the output deflection scanning data. The printing pattern irradiated with the electron beam is input to a bit map memory by dots which correspond to the points which are irradiated with the electron beam. A radiation control means can ascertain whether or not the point which is to be irradiated with the electron beam has already been subjected to beam irradiation at real …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed February 20, 1990 and granted July 20, 1993. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended February 20, 2010.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by February 20, 2012.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.