Apparatus and method for processing one or more wafers of material
CA 2006762 A1 · Owner: Maex, Karen I. J. · Inventors: Maex, Karen I. J.; Vandenabeele, Peter M. N.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Wafers having at least on one side a pattern of more and less conducting areas, are processed by the following steps. The wafer is transported into a space having a reflecting wall to which the patterned side is to be turned and heated by means of, a radiation source from the side opposite the patterned side. Measuring of the temperature of the wafer at the patterned side and at the reflecting wall is done through a radiation sensitive device or pyrometer. The apparatus has a connection for creating underpressure in the space. The reflecting wall is formed by stainless steel onto which is applied aluminium and optionally a layer of SiO2, the non-reflecting parts of the space or chamber …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed December 28, 1989. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended December 28, 2009.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by December 28, 2011.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.