Process for etching a metal oxyde coating and simultaneous deposition of a polymer film, application of this process to the production of a transistor
CA 2005758 A1 · Owner: Chouan, Yannick · Inventors: Chouan, Yannick; Favennec, Jean-Luc
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Process for the etching of a metal oxide coating and the simultaneous deposition of a polymer film and the application of this process to the production of a transistor. The process of the invention consists of subjecting a metal oxide coating (106, 108), located on a glass substrate (100) to the action, of a gaseous plasma (109) containing 10 to 88% by volume of hydrogen 2 to 30% by volume of a hydrocarbon and 10 to 50% of an inert vector gas, bringing about the formation of a polymer coating (110) on the parts of the substrate not provided with oxide by dissocation of, the gaseous mixture and the partial chemical etching of the oxide (106, 108) by the formation of organometallic compounds.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed December 18, 1989. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended December 18, 2009.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by December 18, 2011.
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.