Accelerated sputtering system
CA 2002192 A1 · Owner: Aung, David K. · Inventors: Aung, David K.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A process for coating a diagram on a substrate is disclosed, wherein a metal mask is applied to a prepared substrate and subjected to vacuum etching followed by vacuum sputtering. The sputter coating is accomplished at high vacuum using a plurality of spinning magnetrons to give an even deposition of metal on the substrate as well as an acceptable rate of deposition. After the desired thickness of metal is sputtered onto the substrate the, metal mask is stripped from the substrate and the product is finished using known techniques.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed November 3, 1989. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended November 3, 2009.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by November 3, 2011.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.