Photosensitive composition
CA 2000111 A1 · Owner: Konica Corporation · Inventors: Nakai, Hideyuki; Goto, Kiyoshi; Fujita, Yoshiko
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A photosensitive composition comprising (a) a 1,2naphthoquinone-2-diazido-4-sulfonic acid ester compound (b) alkali-soluble resin, (c) a halomethyloxadiazole compound which releases halogen free radicals by irradiation with actinic rays and (a) a dye which interacts withthe decomposition product of said halomethyloxydiazole compound and discolors or develops color. The composition exhibits excellent development latitude, light safety, visible-on-exposure characteristic and printing resistance.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed October 3, 1989. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended October 3, 2009.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by October 3, 2011.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.