Method and apparatus for the plasma etching substrate cleaning or deposition of materials by d.c. glow discharge

Abstract From the Canadian patent

The invention provides new methods and apparatus for the deposition of materials on substrates by the use of a D.C. glow discharge sometimes also called a plasma discharge. A precursor gas (or gases), which is a decomposable compound of the required material, is introduced at low pressure (10-500 milliTor) into an enclosure containing two spaced parallel cathode electrodes and an intermediate parallel anode electrode preferably midway between the two cathodes. Upon the application of a suitable positive potential to the anode a deposition plasma is generated in the space on both sides of the anode, primarily it is believed by electrons that oscillate back and forth through the anode, giving …