Polymeric compounds
CA 1338947 C · Owner: Johnstone, Robert Alexander Walker · Inventors: Johnstone, Robert Alexander Walker; Wade, John Robert
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A polymeric material for use in radiation sensitive compositions for coatings in printing plate production or photoresists is derived from a polymer having a plurality of pendant hydroxy groups attached to the polymer backbone, or a side chain thereof and, includes sulphonate groups selected from the group consisting of the following sulphonate groups: , and, where X is an aliphatic, aromatic carbocyclic or, heterocyclic group; Y is hydrogen halogen, or an, alkyl, aryl, alkoxy, aryloxy or aralkyl group CO2-Z+, CO2R or SO3-Z+; Z+ is a cationic counter-ion R is hydrogen, alkyl, alkylene, aryl or aralkyl group and Oa is derived from a hydroxyl group of the polymer, less H.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted February 25, 1997. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended February 25, 2014.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.