Water-developable photosensitive resin composition, and resin or printing plate therefrom
CA 1332212 C · Owner: Umeda, Yasushi · Inventors: Umeda, Yasushi; Kimoto, Koichi; Kawanami, Toshitaka
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
1-, Abstract:, The present invention discloses a water-developable photosensitive resin composition capable of hot melt molding which comprises: (i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer of a vinyl ester and another copolymerizable monomer which has a, saponification degree of the vinyl ester unit of 50 to 70 mol % and a hot melt flow starting temperature of 60 to 130°C (ii) a polymerizable monomer and (iii) a photopolymerization initiator.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted October 4, 1994. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended October 4, 2011.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.