Photoresist compositions
CA 1331926 C · Owner: Losert, Ewald · Inventors: Meier, Kurt; Losert, Ewald
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Positive-working photoresist compositions containing (a) an epoxide resin which can be hardened by heat (b) a latent, urea or imidazole hardener for the component (a) and (c) an ironarene complex of the formula (I), (I), in which n is 1 or 2 m is 1, 2, 3, 4 or 5, X is a non-, nucleophilic anion R1 is a .pi.-arene and R2 is an anion of a .pi.-arene, are described. These compositions are distinguished by good properties towards heat and chemicals and require short exposure times.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted September 13, 1994. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended September 13, 2011.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.