Zirconium oxide sinter for forming thin film thereof and method for production of the same
CA 1331272 C · Owner: Tosoh Corporation · Inventors: Uemura, Kinitiro; Uema, Tutomu; Minoya, Katuo
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Zirconium oxide sinter for use in forming a thin film thereof by vapour deposition etc. having a purity not less than 99.0 % by weight with unavoidable hafnium oxide and a density more than 4.9 g/cm3. Desirably the sinter further contains calcium oxide in an amount from 50 to 2000 ppm. The sinter can produce a uniform zirconium oxide thin film which can be used in optical applications with superior characteristics.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted August 9, 1994. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended August 9, 2011.
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.