Water-developable photosensitive plate and its production
CA 1330736 C · Owner: Konishi, Katsuji · Inventors: Kusuda, Hidefumi; Konishi, Katsuji; Ishikawa, Katsukiyo
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The present invention is directed to a waterdevelopable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) an .alpha. .beta.-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha. .beta.-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being …
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted July 19, 1994. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended July 19, 2011.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.