Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
CA 1328883 C · Owner: Ciba Specialty Chemicals Holding Inc. · Inventors: Roth, Martin; Wolleb, Heinz; Schulthess, Adrian
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds, Abstract, The present invention relates to a negative photoresist essentially comprising, a) at least one solid, film-forming polyphenol b) at least one polyfunctional epoxy resin and/or one polyfunctional vinyl ether compound, each of which can be dissolved in the uncured, state, in aqueous alkaline media with salt formation c) at least one cationic photoinitiator for component b) and d) customary additives, if desired. Components a) and b) can also be combined in one molecule. The resist can be developed in aqueous alkaline media.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 26, 1994. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 26, 2011.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.