Radiation-sensitive recording material and process for the production thereof
CA 1318540 C · Owner: Hoechst Aktiengesellschaft · Inventors: Seibel, Markus; Kaempf, Guenther
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Disclosed is a radiation-sensitive recording material comprising a support, a radiation-sensitive recording layer and a rough covering layer which is applied by spraying and drying a solution which has substantially the same composition as the recording layer. Due to its rough surface, the material provides for accelerated vacuum contact in the copying process. Also disclosed is a process for producing the radiation-sensitive recording material described above.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted June 1, 1993. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended June 1, 2010.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.