Positive type photosensitive resinous composition
CA 1316622 C · Owner: Shirai, Masamitsu · Inventors: Tanaka, Makoto; Tsunooka, Masahiro; Nishijima, Kanji
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A positive type photosensitive resinous composition which is specifically useful in a photoresist for printed circuit board, integrated circuit board and the like and in a lithographic plate is provided. The resinous composition is characterized by comprising a resin having in its side chains or at the end portions of main chain at least one iminosulfonate group of the formula: in which R1 and R2 each is selected from hydrogen atom an, alkyl, an acyl, a phenyl, a naphthyl an anthryl and a, benzyl group, or R1 and R2 may taken together, form an, alicyclic ring the iminosulfonate content being 1.5 x 10-4 to 2.5 x 10-3 equivalent/g and the resin being free from glycidyl group or the like which …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 20, 1993. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 20, 2010.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.