Photoreactive polymers and production of a two-layer resist
CA 1314652 C · Owner: Koch, Horst · Inventors: Koch, Horst; Schwalm, Reinhold
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract of the Disclosure: Silicon-containing photoreactive Polymers have N-ylide structures of N-hetero aromatics which undergo photochemical structural and property changes when exposed to actinic light. They are suitable for the production of two-layer photoresists.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted March 16, 1993. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended March 16, 2010.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.