Method for modifying the surface of finely divided silica
CA 1307094 C · Owner: Kobayashi, Hideki · Inventors: Ohnishi, Masayuki; Kobayashi, Hideki
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract, In the present invention, finely divided silica is treated with two types of organosilicon compounds (i) an organosilicon compound having the general formula wherein R is a monovalent hydrocarbon group; n is an integer having a value of 0 to 10; and Q is an alkoxy group, halogen atom, or hydroxyl group and, (ii) an organosilicon compound having the general formula (R3Si)a-Z, wherein R is a monovalent hydrocarbon group; a is 1 or 2; when a eguals 1, Z is a hydrogen atom halogen atom, hydroxyl group, alkoxy group -NR12' -ONR12' or -OCOR1;, when a equals 2 Z is -O- or -NR1-; and R1 is the, hydrogen atom or an alkyl group. The present invention characteristically affords a finely …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted September 8, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended September 8, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.