Electric arc vapor deposition method and apparatus

Abstract From the Canadian patent

An improved method and apparatus for maintaining cathode spots in an electric arc vapor deposition coating process, on the desired cathode evaporation surface are disclosed. A primary anode is arranged configured and biased within a vacuum deposition coating chamber relative to a cathodic source so as to maintain an electric arc therebetween. A relative biasing network maintains a voltage difference during deposition between the primary anode and other conductive surfaces within the chamber, or the chamber wall itself, such that electrons leaving the cathode are preferentially drawn toward the primary anode rather than to other conductive surfaces. The anode orientation within the chamber …