Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
CA 1306568 C · Owner: Novartis Ag · Inventors: Roth, Martin; Meier, Kurt
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
3-16036/+, Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers, Abstract, The present invention relates to a negative photoresist consisting essentially of, a) at least one solid film-forming polyphenol b) at least one compound which contains at least two epoxide groups or at least two vinyl ether groups or at least one epoxide and vinyl ether group in the molecule c) at least one cationic photoinitiator for component b) and d) if appropriate customary additives. The resist can be developed under aqueous-alkaline conditions.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted August 18, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended August 18, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.