Substrate cleaning device
CA 1305564 C · Owner: Ito, Hiroki · Inventors: Ina, Teruo; Ito, Hiroki
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A thin film forming and substrate cleaning device comprises a vacuum tank held at the predetermined degree of vacuum; a substrate placed in the vacuum tank; internal tanks disposed in the vacuum tank and each having an opening opposite to the substrate; gas jet nozzles arranged in the internal tank and connected with reactive gas sources outside the vacuum tank for jetting reactive gases of different types toward the substrate through the opening of the internal tank; and electron beam irradiation means disposed close to a passage, through which the reactive gases jetted from the gas jet nozzles pass for irradiating, electron beams to the reactive gases.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted July 21, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended July 21, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.