Exposure control system for full field photolithography using pulsed sources
CA 1300717 C · Owner: Svg Lithography Systems, Inc. · Inventors: Tracy, David H.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A photolithography exposure control system tolerant of noisy pulsed light sources having a controllable variable attenuator. A detector monitors the exposure dose of a light pulse enabling a controller to trigger another light pulse when a predetermined attenuator is positioned in its path. A high degree of exposure control is achieved with a minimum number of light pulses or shots.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted May 12, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended May 12, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.