Techniques useful in fabricating semiconductor devices having submicron features
CA 1299770 C · Owner: American Telephone And Telegraph Company · Inventors: Feygenson, Anatoly
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract, Submicron resolution in the fabrication of transistors is obtained by using sidewall techniques. The techniques described remove the sidewalls after an oxidation step and the openings so formed by the removal are used as a mask for subsequent substrate modification by either diffusion or ion implantation.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 28, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 28, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.