Solvent developable photoresist film
CA 1298511 C · Owner: Cyr, Clifford R. · Inventors: Hagan, Nancy C.; Cyr, Clifford R.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
TITLE, Improved Solvent Developable Photoresist Film ABSTRACT, A multi-layer photosensitive film resist (is provided) in which the photosensitive layers (consists of) a plurality of layers having different properties, e.g. greater adhesion to a copper surface provided by one layer and greater toughness and (possibly) reduced adhesion to a temporary support provided by the other layer. PD 1722
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 7, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 7, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.