Apparatus and method for photochemical vapor deposition

Abstract From the Canadian patent

Abstract Of The Disclosure, A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone The window is kept, clear by a gas flowing through the flush zone.