Non-precipitating photoresist composition
CA 1296560 C · Owner: Eastman Kodak Company · Inventors: Lussier, Barbara B.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract, There is disclosed a photoresist composition comprising a light-sensitive, quinone diazide polymer a binder and a benzene monomer trisubstituted with a diazo-naphthoquinone-sulfonyloxy group. The composition is improved in that the diazo-naphthoquinonesulfonyloxy group occupies the 1,2,4-positions on the benzene ring, whereby improved solubility is achieved.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted March 3, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended March 3, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.